Discover how helium leak testing — using mass spectrometry to detect leaks as small as 4×10⁻⁹ Std CC/sec — provides orders-of-magnitude greater hermetic integrity than standard O-ring seals, and why the Whitman Controls W117 Ultra Pure series meets this standard for semiconductor, medical, and aerospace applications.
Discover how the Whitman Controls W117 Series — with all-welded 316L stainless steel construction, electron beam welding, and helium leak testing to 4×10⁻⁹ Std CC/sec — delivers zero-contamination pressure and vacuum monitoring for semiconductor ALD equipment, medical radiography, and aerospace electron beam welding chambers.
Discover how Whitman Controls’ L95 hydrostatic and L96 capacitance level transmitters deliver real-time chemical inventory data — enabling predictive replenishment, early leak detection, and precision process control in aggressive, pressurized, and ultra-pure chemical storage environments.
Not all industrial enclosures offer the same protection. NEMA 4, 4X, and 6 ratings each serve a distinct purpose — from handling heavy washdowns to resisting corrosive chemicals and surviving full submersion. Understanding the difference ensures your sensors and switches are built to last in the environments they actually operate in.
Hysteresis in industrial pressure switches defines the lag between a switch’s actuation set point and its reset point also known as the deadband or differential. Understanding and correctly specifying this differential is critical for preventing system chatter, extending motor life, and ensuring reliable performance in demanding applications. Learn how Whitman Controls engineers predictable, repeatable hysteresis into every pressure and vacuum switch, from field-adjustable models like the P117 and J205 series to severe-duty piston-actuated switches that withstand spikes up to 9,000 PSIG.
Discover how Whitman Controls’ L95 hydrostatic and L96 capacitance level transmitters deliver real-time chemical inventory data — enabling predictive replenishment, early leak detection, and precision process control in aggressive, pressurized, and ultra-pure chemical storage environments.
